國家標(biāo)準(zhǔn)
本規(guī)范共分8章和1個附錄,主要技術(shù)內(nèi)容包括:總則,術(shù)語,基本規(guī)定,低溫共燒陶瓷及厚膜基板制造工藝設(shè)備安裝、調(diào)試及試運行,薄膜基板制造工藝設(shè)備安裝、調(diào)試及試運行,組裝封裝工藝設(shè)備安裝、調(diào)試及試運行,工藝檢測設(shè)備安裝、調(diào)試及試運行,工程驗收等。
GB51037-2014······1
1 總 則······13
2 術(shù) 語······14
3 基本規(guī)定······16
3.1 施工條件······16
3.2 設(shè)備開箱······17
3.3 設(shè)備搬運······17
3.4 設(shè)備安裝······18
3.5 設(shè)備調(diào)試與試運行······19
4 低溫共燒陶瓷及厚膜基板制造工藝設(shè)備安裝、調(diào)試及試運行······21
4.1 一般規(guī)定······21
4.2 流延機······21
4.3 切片機······22
4.4 生瓷打孔機······22
4.5 激光打孔機······23
4.6 微孔填充機······24
4.7 絲網(wǎng)印刷機······25
4.8 疊片機······25
4.9 等靜壓層壓機······27
4.10 熱切機······27
4.11 低溫共燒陶瓷燒結(jié)爐······28
4.12 厚膜燒結(jié)爐······29
4.13 激光調(diào)阻機······29
5 薄膜基板制造工藝設(shè)各安裝、調(diào)試及試運行······30
5.1 一般規(guī)定······30
5.2 磁控濺射鍍膜機······30
5.3 真空蒸發(fā)鍍膜機······31
5.4 化學(xué)氣相淀積系統(tǒng)······33
5.5 旋涂及熱板系統(tǒng)······34
5.6 曝光機······35
5.7 顯影臺······36
5.8 反應(yīng)離子刻蝕機······37
5.9 化學(xué)機械拋光機······38
6 組裝封裝工藝設(shè)備安裝、調(diào)試及試運行······40
6.1 一般規(guī)定······40
6.2 芯片粘片機······40
6.3 芯片共晶焊機······41
6.4 共晶爐······41
6.5 引線鍵合機······42
6.6 倒裝焊機······43
6.7 等離子清洗機······43
6.8 選擇性涂覆機······44
6.9 平行縫焊機······44
6.10 儲能焊機······45
6.11 激光焊機······46
7 工藝檢測設(shè)備安裝、調(diào)試及試運行······48
7.1 一般規(guī)定······48
7.2 飛針測試系統(tǒng)······48
7.3 聲學(xué)掃描檢測系統(tǒng)······49
7.4 3D光學(xué)測量儀······49
7.5 自動光學(xué)檢查儀······50
7.6 激光測厚儀······50
7.7 X射線檢查儀······51
7.8 芯片剪切力/引線拉力測試儀······51
8 工程驗收······53
8.1 一般規(guī)定······53
8.2 交接驗收······53
8.3 竣工驗收······54
8.4 驗收不合格的處置······55
附錄A 微組裝生產(chǎn)線工藝設(shè)備安裝工程驗收記錄用表······56
本規(guī)范用詞說明······61
引用標(biāo)準(zhǔn)名錄······62
附:條文說明······63
1 總 則······67
3 基本規(guī)定······69
3.1 施工條件······69
3.2 設(shè)備開箱······69
3.3 設(shè)備搬運······70
3.4 設(shè)備安裝······70
3.5 設(shè)備調(diào)試與試運行······72
4 低溫共燒陶瓷及厚膜基板制造工藝設(shè)備安裝、調(diào)試及試運行······74
4.1 一般規(guī)定······74
4.2 流延機······74
4.3 切片機······75
4.4 生瓷打孔機······75
4.5 激光打孔機······75
4.7 絲網(wǎng)印刷機······76
4.9 等靜壓層壓機······76
4.11 低溫共燒陶瓷燒結(jié)爐······77
4.12 厚膜燒結(jié)爐······77
4.13 激光調(diào)阻機······77
5 薄膜基板制造工藝設(shè)各安裝、調(diào)試及試運行······78
5.1 一般規(guī)定······78
5.2 磁控濺射鍍膜機······78
5.3 真空蒸發(fā)鍍膜機······79
5.4 化學(xué)氣相淀積系統(tǒng)······79
5.5 旋涂及熱板系統(tǒng)······80
5.6 曝光機······80
5.7 顯影臺······80
5.8 反應(yīng)離子刻蝕機······81
5.9 化學(xué)機械拋光機······81
6 組裝封裝工藝設(shè)備安裝、調(diào)試及試運行······82
6.1 一般規(guī)定······82
6.2 芯片粘片機······82
6.3 芯片共晶焊機······83
6.4 共晶爐······83
6.5 引線鍵合機······83
6.6 倒裝焊機······83
6.8 選擇性涂覆機······84
6.9 平行縫焊機······84
6.11 激光焊機······84
7 工藝檢測設(shè)備安裝、調(diào)試及試運行······85
7.1 一般規(guī)定······85
7.2 飛針測試系統(tǒng)······85
7.3 聲學(xué)掃描檢測系統(tǒng)······85
7.6 激光測厚儀······86
7.7 X射線檢查儀······86
8 工程驗收······87
8.1 一般規(guī)定······87
8.2 交接驗收······88
8.3 竣工驗收······89
8.4 驗收不合格的處置······89
下載地址
同類標(biāo)準(zhǔn)
GB/T51147-2015:硝胺類廢水處理設(shè)施技術(shù)規(guī)范
時間:2024-02-25 20:13:53GB/T51241-2017:管道外防腐補口技術(shù)規(guī)范
時間:2024-02-25 20:13:27GB/T51264-2017:雙向拉伸薄膜工廠設(shè)計標(biāo)準(zhǔn)
時間:2024-02-25 20:12:15GB/T51259-2017:腈綸設(shè)備工程安裝與質(zhì)量驗收規(guī)范
時間:2024-02-25 20:13:02GB51237-2017:火工品試驗室工程技術(shù)規(guī)范
時間:2024-02-25 20:12:37GB50488-2018:腈綸工廠設(shè)計標(biāo)準(zhǔn)
時間:2024-02-25 20:11:48